Chemical Vapour Deposition

The PSI CVD/CVI systems are designed and tested to international standards. Constructed from stainless steel the vacuum-pressure vessel encases either a vertically or horizontally orientated corrosion-resistant furnace.

Typically manufactured in graphite the retort facilitates hot zones of 600mm diameter x 900mm long down to research-scale systems of 150mm diameter x 460mm. Furnace temperatures of 1300 deg C are achieved as standard with a high temperature alternative to 2200 deg C. Specialist, chemically-resistant vacuum facilities are essential as the gas scrubbing system for compliance with local disposal regulations.

With some CVI processing taking days to complete, a fully-automated PLC-based control system and data-logging is essential. Computer-control is available for remote operation and full process data-logging for QC/QA requirements. For client satisfaction purposes, it is PSI’s policy to define the eventual equipment specification only after technical discussion with the client and our own consultants.

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Coating Material Process Gases Typical Deposition Temperatures
Silicon Carbide CH3SiCl3 1300
Boron Nitride BCl3-NH3 1800
Carbon (Graphite) CH4-H2 220
Titanium Carbide TiCl4-H2 800
Titanium Nitride TiCl4-H2 900
Silicon Nitride SiCl4-N2-NH3 1300
Aluminium Nitride AlCl3-NH3 800